Effects of Measurement Distance on Measurements of Symmetrically Shaped Patterns Generated by Line Sources

Abstract

[Abstract] Symmetrically shaped patterns, generated by real continuous linear apertures derived from Taylor distributions, resemble Taylor sum patterns in regard to the distance-dependence of their sidelobe heights. Their ripple shows negligible near-field degradation. If the aperture distribution is complex, however, the ripple and sidelobe levels show previously unreported degradation behavior, including a lowering of the first sidelobe level.