Effects of Measurement Distance on Measurements of Symmetrically Shaped Patterns Generated by Line Sources
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Effects of Measurement Distance on Measurements of Symmetrically Shaped Patterns Generated by Line SourcesFecha
2003-02Cita bibliográfica
J. C. Brégains ; F. Ares ; E. Moreno "Effects of measurement distance on measurements of symmetrically shaped patterns generated by line sources", IEEE Antennas and Propagation, IEEE, 106 - 109 Volume: 45, Issue: 1, Feb. 2003
Resumen
[Abstract] Symmetrically shaped patterns, generated by real continuous linear apertures derived from Taylor distributions, resemble Taylor sum patterns in regard to the distance-dependence of their sidelobe heights. Their ripple shows negligible near-field degradation. If the aperture distribution is complex, however, the ripple and sidelobe levels show previously unreported degradation behavior, including a lowering of the first sidelobe level.
Palabras clave
Antenna radiation patterns
Linear antenna arrays
Shaped beam antennas
Linear antenna arrays
Shaped beam antennas
Versión del editor
ISSN
1045-9243