ListarGrupo de Tecnoloxía Electrónica e Comunicacións (GTEC) por tema "Pattern analysis"
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Measurement Effects on Ø-Symmetric Shaped Patterns Generated by Circular Continuous Apertures
(Institute of Electrical and Electronics Engineers, 2003-10)[Abstract] Sidelobe-level and ripple behaviors of Ø-symmetric shaped patterns, generated by circular, real and complex, continuous Taylor distributions, is analyzed as a function of measurement distances. This paper reveals ...