Effects of Measurement Distance on Measurements of Symmetrically Shaped Patterns Generated by Line Sources
| UDC.coleccion | Investigación | es_ES |
| UDC.departamento | Enxeñaría de Computadores | es_ES |
| UDC.endPage | 109 | es_ES |
| UDC.grupoInv | Grupo de Tecnoloxía Electrónica e Comunicacións (GTEC) | es_ES |
| UDC.issue | 1 | es_ES |
| UDC.journalTitle | IEEE Antennas and Propagation Magazine | es_ES |
| UDC.startPage | 106 | es_ES |
| UDC.volume | 45 | es_ES |
| dc.contributor.author | Brégains, Julio | |
| dc.contributor.author | Ares Pena, F. J. | |
| dc.contributor.author | Moreno Piquero, E. | |
| dc.date.accessioned | 2016-08-22T10:27:18Z | |
| dc.date.available | 2016-08-22T10:27:18Z | |
| dc.date.issued | 2003-02 | |
| dc.description.abstract | [Abstract] Symmetrically shaped patterns, generated by real continuous linear apertures derived from Taylor distributions, resemble Taylor sum patterns in regard to the distance-dependence of their sidelobe heights. Their ripple shows negligible near-field degradation. If the aperture distribution is complex, however, the ripple and sidelobe levels show previously unreported degradation behavior, including a lowering of the first sidelobe level. | es_ES |
| dc.identifier.citation | J. C. Brégains ; F. Ares ; E. Moreno "Effects of measurement distance on measurements of symmetrically shaped patterns generated by line sources", IEEE Antennas and Propagation, IEEE, 106 - 109 Volume: 45, Issue: 1, Feb. 2003 | es_ES |
| dc.identifier.doi | 10.1109/MAP.2003.1189654 | |
| dc.identifier.issn | 1045-9243 | |
| dc.identifier.uri | http://hdl.handle.net/2183/17215 | |
| dc.language.iso | eng | es_ES |
| dc.publisher | Institute of Electrical and Electronics Engineers | es_ES |
| dc.relation.uri | http://dx.doi.org/10.1109/MAP.2003.1189654 | es_ES |
| dc.rights.accessRights | open access | es_ES |
| dc.subject | Antenna radiation patterns | es_ES |
| dc.subject | Linear antenna arrays | es_ES |
| dc.subject | Shaped beam antennas | es_ES |
| dc.title | Effects of Measurement Distance on Measurements of Symmetrically Shaped Patterns Generated by Line Sources | es_ES |
| dc.type | journal article | es_ES |
| dspace.entity.type | Publication | |
| relation.isAuthorOfPublication | dea37bb9-4430-472b-a48c-c5a8ca42b84b | |
| relation.isAuthorOfPublication.latestForDiscovery | dea37bb9-4430-472b-a48c-c5a8ca42b84b |
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