Effects of Measurement Distance on Measurements of Symmetrically Shaped Patterns Generated by Line Sources

Brégains, Julio; Ares Pena, F. J.; Moreno Piquero, E.

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http://hdl.handle.net/2183/17215

Effects of Measurement Distance on Measurements of Symmetrically Shaped Patterns Generated by Line Sources

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Brégains_Julio_2003_Effects_of_measurement_distance_on_measurements_of_symmetrically_shaped_patterns_generated_by_line_sources.pdf (265.55 KB)

Identifiers

URI: http://hdl.handle.net/2183/17215

DOI: 10.1109/MAP.2003.1189654

Publication date

2003-02

Authors

Brégains, Julio

Ares Pena, F. J.

Moreno Piquero, E.

Bibliographic citation

J. C. Brégains ; F. Ares ; E. Moreno "Effects of measurement distance on measurements of symmetrically shaped patterns generated by line sources", IEEE Antennas and Propagation, IEEE, 106 - 109 Volume: 45, Issue: 1, Feb. 2003

Abstract

[Abstract] Symmetrically shaped patterns, generated by real continuous linear apertures derived from Taylor distributions, resemble Taylor sum patterns in regard to the distance-dependence of their sidelobe heights. Their ripple shows negligible near-field degradation. If the aperture distribution is complex, however, the ripple and sidelobe levels show previously unreported degradation behavior, including a lowering of the first sidelobe level.