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http://hdl.handle.net/2183/39396 Development of a PLE Factory Environment with GitLab Integration and following ISO/IEC 26580
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A. Buján, A. Cortiñas, and M. Rodríguez Luaces, "Development of a PLE Factory Environment with GitLab Integration and following ISO/IEC 26580", presented at SPLC '24: Proceedings of the 28th ACM International Systems and Software Product Line Conference, ACM International Conference Proceeding Series, pp. 34 - 37, sept. 2024, https://doi.org/10.1145/3646548.3678013
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[Abstract]: Product Line Engineering (PLE) is a strategic approach in software engineering. Existing PLE factory development environments often lack integration with modern development and version control platforms, limiting their efficiency. We present a PLE factory development environment that meets the ISO/IEC 26580 standard and integrates with GitLab and git repositories to manage feature catalogues, bill-of-features portfolios, shared assets, and product instances. Our tool uses the Universal Variability Language (UVL) for feature modeling, offering a feature model editor for domain analysis and a source code editor for domain implementation. For application engineering, it supports requirements analysis via a bill-of-features editor and product derivation using the spl-js-engine. The tool also defines a git branching model to automate product asset changes and includes real-time tracking and historical visualization of the derivation process for each product configuration. A demonstration of the tool is available at https://doi.org/10.5281/zenodo.12700667.
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Versión aceptada de: A. Buján, A. Cortiñas, and M. Rodríguez Luaces, "Development of a PLE Factory Environment with GitLab Integration and following ISO/IEC 26580", presented at SPLC '24: Proceedings of the 28th ACM International Systems and Software Product Line Conference, ACM International Conference Proceeding Series, pp. 34 - 37, sept. 2024, https://doi.org/10.1145/3646548.3678013
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© 2024 Owner/Author | ACM. This is the author's version of the work. It is
posted here for your personal use. Not for redistribution. The definitive Version
of Record was published in ACM International Conference Proceeding Series,
http://dx.doi.org/10.1145/3646548.3678013.







