Patrones Oscuros para Realidad Extendida: Desafíos Éticos y Prácticos

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D. Ramil López, P. Fraga-Lamas, and T. M. Fernández-Caramés, "Patrones Oscuros para Realidad Extendida: Desafíos Éticos y Prácticos", XXXIX Simposio Nacional de la Unión Científica Internacional de Radio, URSI 2024, Escuela Politécnica de Cuenca, Universidad de Castilla-La Mancha, 4 a 6 de septiembre de 2024.

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[Abstract]: The fusion of Augmented, Mixed and Virtual Reality known as Extended Reality (XR) is revolutionizing how we interact with digital environments. This paper explores the concept of dark patterns, which are intentionally deceptive user interface designs that manipulate users into making decisions that benefit the designer. Investigating these dark patterns in XR application design is of interest because it reveals how they can impact user experience, raise ethical concerns, and have far-reaching implications in near-future Metaverse applications. Furthermore, the introduction of a novel classification system for XR, comprising five types of dark patterns, underscores the importance of enhanced user education and stricter ethical guidelines enforcement to safeguard privacy and data in XR scenarios. This approach provides a comprehensive understanding of the practical hurdles posed by dark patterns, encompassing issues like user wellbeing, ethical design, and the influence of these patterns on user perceptions and behaviors within the rapidly advancing technological landscape.

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Presentado en: XXXIX Simposio Nacional de la Unión Científica Internacional de Radio, URSI 2024, Escuela Politécnica de Cuenca, Universidad de Castilla-La Mancha, 4 a 6 de septiembre de 2024.

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Atribución 3.0 España
Atribución 3.0 España

Except where otherwise noted, this item's license is described as Atribución 3.0 España