Instance Segmentation Models for Real-Time Progress Monitoring and Quality Control in Industrial Plant Construction

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Valladares Poncela, Antón
Vilar-Martínez, Javier

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A. Valladares-Poncela, T. M. Fernández-Caramés, J. Vilar-Martínez and P. Fraga-Lamas, "Instance Segmentation Models for Real-Time Progress Monitoring and Quality Control in Industrial Plant Construction," 2026 IEEE 24th World Symposium on Applied Machine Intelligence and Informatics (SAMI), Stará Lesná, Slovakia, 2026, pp. 473-478, doi: 10.1109/SAMI68106.2026.11420566.

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[Abstract]: This paper proposes a progress monitoring solution through instance segmentation models for real-time production monitoring and quality control in industrial environments. The obtained results address digitalization challenges for automated monitoring of early-stage construction elements including foundation excavations, cast-in-place foundations, steel I-beam and lattice beam placement. Specifically, state-of-the-art instance segmentation architectures are evaluated, consisting of recent YOLO models (YOLOv8-seg, YOLOv11-seg) as well as established approaches (Mask R-CNN, Mask2Former) for industrial monitoring systems integration. An evaluation framework is established that integrates accuracy metrics (mask mean Average Precision (mAP)) with production efficiency measures including real-time processing (FPS) and deployment constraints. The performed analyses reveal accuracy-speed trade-offs essential for real-time applications in Industry 5.0 scenarios, where YOLO variants provide real-time monitoring capabilities and two-stage approaches deliver enhanced precision. Experimental results demonstrate that YOLOv8-seg variants achieve optimal performance with mAP@0.5:0.95 up to 54.09 % at 65 FPS, while YOLOv11-seg models provide superior parameter efficiency for resource-constrained environments.

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Pressented at: SAMI 2026, IEEE 24th World Symposium on Applied Machine Intelligence and Informatics, January 29–31, 2026, Stará Lesná, Slovakia © 2026 IEEE. This version of the article has been accepted for publication, after peer review. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. The Version of Record is available online at: https://doi.org/10.1109/SAMI68106.2026.11420566

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